Apparatus, system and method for controlling emission parameters

Coating processes – Measuring – testing – or indicating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4272481, 118688, 118708, 118712, 118720, 118726, C23C 1400

Patent

active

059068574

ABSTRACT:
An apparatus, system and method for controlling parameters attending the emission of a vaporized material from a source in a HV environment utilizes at least one shutter which is rotatably mounted over an exit opening through which vaporized material must exit the source. The shutter has a closure portion and is mounted adjacent the exit opening associated with the source for rotation about an axis so that by rotating the shutter about the rotation axis, the closure portion repeatedly covers and uncovers the exit opening in an intermittent fashion to prevent the emission of a vaporized material from the source during the periods of shutter rotation during which the exit opening is covered by the closure portion and to permit the emission of a vaporized material from the source during the periods of shutter rotation during which the exit opening is uncovered by the closure portion. By using a pair of superposed shutters whose closure portions can be positionally altered with respect to one another, the intervals during which the exit opening is uncovered by the closure portions throughout each revolution of the shutters can be adjusted. In addition, the accuracy of control of the emission parameters can be enhanced by monitoring the emission of the vaporized material from the source and altering appropriate conditions, such as the speed of rotation of the shutter about its rotation axis, in response to the monitored characteristics. Further still, this invention fundamentally shifts the functional capability of MBE methodology away from its traditional 1 monolayer/second limitation.

REFERENCES:
patent: 3636916 (1972-01-01), Thelen
patent: 4328763 (1982-05-01), Sommerkamp et al.
patent: 4543467 (1985-09-01), Eisele et al.
patent: 4579083 (1986-04-01), Boivin
patent: 5126165 (1992-06-01), Akihama
patent: 5288328 (1994-02-01), Nouvelot
Advertisement literature relating to effusions cells from Pascal Technologies, Eden Prairie, Minnesota: 4 pieces, no date.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus, system and method for controlling emission parameters does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus, system and method for controlling emission parameters, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus, system and method for controlling emission parameters will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-400567

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.