Apparatus of inspecting defect in semiconductor and method...

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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C356S237100, C356S394000, C356S237400

Reexamination Certificate

active

07952699

ABSTRACT:
When size of a defect on an increasingly miniaturized pattern is obtained by defect inspection apparatus in the related art, a value is inconveniently given, which is different from a measured value of the same defect by SEM. Thus, a dimension value of a defect detected by defect inspection apparatus needs to be accurately calculated to be approximated to a value measured by SEM. To this end, size of the defect detected by the defect inspection apparatus is corrected depending on feature quantity or type of the defect, thereby defect size can be accurately calculated.

REFERENCES:
patent: 4626101 (1986-12-01), Ogawa et al.
patent: 5146509 (1992-09-01), Hara et al.
patent: 5691812 (1997-11-01), Bates et al.
patent: 5822055 (1998-10-01), Tsai et al.
patent: 5936726 (1999-08-01), Takeda et al.
patent: 6104481 (2000-08-01), Sekine et al.
patent: 6167355 (2000-12-01), Fiekowsky
patent: 6246472 (2001-06-01), Yoda et al.
patent: 6246787 (2001-06-01), Hennessey et al.
patent: 6256092 (2001-07-01), Tomita et al.
patent: 6411377 (2002-06-01), Noguchi et al.
patent: 6515742 (2003-02-01), Ruprecht
patent: 6597448 (2003-07-01), Nishiyama et al.
patent: 6797975 (2004-09-01), Nishiyama et al.
patent: 6816249 (2004-11-01), Fairley et al.
patent: 6888959 (2005-05-01), Hamamatsu et al.
patent: 6928185 (2005-08-01), Yonezawa
patent: 6936835 (2005-08-01), Nishiyama et al.
patent: 7271921 (2007-09-01), Shortt
patent: 7315366 (2008-01-01), Hamamatsu et al.
patent: 7474394 (2009-01-01), Hamamatsu et al.
patent: 7570796 (2009-08-01), Zafar et al.
patent: 7751036 (2010-07-01), Hamamatsu et al.
patent: 05-273110 (1993-10-01), None
patent: 2002-257533 (2002-09-01), None
patent: 2003-098111 (2003-04-01), None
patent: 2005-158780 (2005-06-01), None

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