Apparatus of depositing thin film with high uniformity

Details Apparatus of depositing thin film with high uniformity Apparatus of depositing thin film with high uniformity

2005-11-22

2005-11-22

Bueker, Richard (Department: 1763)

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

C118S729000, C118S730000

Reexamination Certificate

active

06966952

ABSTRACT:
A deposition apparatus of depositing deposition material on a wafer in a vacuum chamber includes a deposition boat installed in the vacuum chamber to vaporize the deposition material, a wafer guide on which the wafer is loaded, the wafer guide having a rotational member rotating together with the wafer, a wafer-rotation device rotating the rotational member when the wafer guide approaches, and a wafer-transfer device reciprocating the wafer guide between an inlet of the vacuum chamber, the deposition boat and the wafer-rotation device.

REFERENCES:
patent: 3662708 (1972-05-01), Shrader
patent: 3889632 (1975-06-01), Brunner et al.
patent: 2004/0035366 (2004-02-01), Keum et al.
patent: 2001-152336 (2001-06-01), None

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