Apparatus, method and system for monitoring chamber...

Details Apparatus, method and system for monitoring chamber... Apparatus, method and system for monitoring chamber...

2005-12-13

2005-12-13

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S298030, C073S001860, C073S086000, C073S866000, C073S432100

Reexamination Certificate

active

06974524

ABSTRACT:
Apparatus and methods for measuring characteristics of a metallic target as well as other interior surfaces of a sputtering chamber. The apparatus includes a sensor configured to emit an energy beam toward a surface of interest and to detect an energy beam therefrom, the detected energy beam being indicative of parameters of a characteristic of interest of the surface of interest. Quantitative and qualitative characteristics of interest may be determined. A sputtering system including the apparatus and operable according to the methods of the invention is also disclosed.

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