Apparatus, method and computer program product for...

Details Apparatus, method and computer program product for... Apparatus, method and computer program product for...

2005-05-05

2008-03-25

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S053000, C716S030000

Reexamination Certificate

active

07349066

ABSTRACT:
Model Based Optical Proximity Correction (MOPC) biasing techniques may be utilized for optimizing a mask pattern. However, conventional MOPC techniques do not account for influence from neighboring features on a mask. This influence may be factored in the following manner—first, generating a predicted pattern from a target pattern and selecting a plurality of evaluation points at which biasing may be determined. Next, a set of multivariable equations are generated for each evaluation point, each equation representing influence of neighboring features on a mask. The equations are solved to determine that amount of bias at each evaluation point, and the mask is optimized accordingly. This process may be repeated until the mask pattern is further optimized.

REFERENCES:
patent: 2003/0110465 (2003-06-01), Zhang
patent: 2004/0102945 (2004-05-01), Liu
patent: 2005/0055658 (2005-03-01), Mukherjee et al.
Australian Search Report and Written Opinion, issued in corresponding Australian Patent Application No. SG 200603016-7, dated on Jul. 3, 2007.

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