Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1993-10-25
1996-05-14
Lee, Benny T.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511141, 333 99PL, 118723MW, 118723MA, 118723AN, 20429838, H05H 146
Patent
active
055170854
ABSTRACT:
A low-pressure high-density plasma is excited in a plasma chamber surrounded by a cylindrical inner wall of a ring-shaped waveguide resonator to which the microwave energy is fed by a coupling from a microwave generator. The output coupling of the microwave energy from the standing wave maintained in the waveguide resonator to the plasma chamber is effected through a multiplicity of equispaced slits whose spacing is one half or one waveguide wavelength and which extend parallel to the generatrices of the cylindrical inner wall of the ring-shaped waveguide resonator.
REFERENCES:
patent: 3577207 (1971-05-01), Kirjushin
patent: 4810938 (1989-03-01), Morsan et al.
patent: 4844007 (1989-07-01), Eikelboom
patent: 5063330 (1991-11-01), Leprince et al.
patent: 5296784 (1994-03-01), Creiseler et al.
Patent Abstract of Japan; 2-132798(A); "Plasma Generating Equipment And Ion Source Using It"; Aug. 9, 1990; vol. 14/No. 368.
Engemann Jurgen
Werner Frank
Dubno Herbert
Engemann Jurgen
Kateshou Yuri
Lee Benny T.
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