Apparatus for washing and drying substrates

Details Apparatus for washing and drying substrates Apparatus for washing and drying substrates

1986-09-25

1987-12-22

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 95, 134135, 134157, B08B 310

Patent

active

047140860

ABSTRACT:
A method for washing and drying a substrate and an apparatus therefor are disclosed which are capable of effectively rapidly carrying out the washing and drying of a semiconductor substrate in good yields without damaging and contaminating the substrate. The method comprises the steps of immersing a carrier carrying at least one substrate thereon into wash liquid; drawing up the carrier from the wash liquid while oscillating the substrate; and feeding drying gas to the substrate during the drawing-up of the carrier to remove the wash liquid from the surface of the substrate. The apparatus of the invention is constructed to allow the method to be effectively practiced.

REFERENCES:
patent: 2959178 (1960-11-01), Rowan
patent: 2972352 (1961-02-01), Ipsen
patent: 3295492 (1967-01-01), Schink
patent: 3893869 (1975-07-01), Mayer et al.
patent: 4318749 (1982-03-01), Mayer
patent: 4471792 (1984-09-01), Koblenzer
patent: 4606398 (1986-08-01), Prikhodko et al.

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