Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1999-09-10
2000-12-26
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
156345, G03F 900
Patent
active
061656518
ABSTRACT:
The present invention provides a method and an apparatus for tuning the phase shifting of a phase shift mask having an attenuating phase shifting material providing at least 160.degree. of phase shift. The method comprising the utilization of a phase measurement and selective etching operations which reduces the challenge of making an exacting 180.degree. phase shifting mask. An attenuated phase shift mask structure is also disclosed in the present invention.
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Ohtsuka, et al., "Conjugate Twin-Shifter for the New Phase Shift Method to High Resolution Lithography," SPIE, vol. 1463, pp. 112-123 (1991).
Yoshioka et al. "Practical Attenuated Phase-Shifting Mask with a Single-Layer Absorptive of MoSiO and MoSiON for ULSI Fabrication," IEEE, IEDM, pp. 653-656 (1993).
Adair William John
O'Grady David Shawn
Peng Song
International Business Machines - Corporation
Rosasco S.
Walter, Jr. Howard J.
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