Apparatus for treating wafers in the manufacture of semiconducto

Details Apparatus for treating wafers in the manufacture of semiconducto Apparatus for treating wafers in the manufacture of semiconducto

1988-06-13

1990-12-25

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

Multizone chamber

118724, 118725, 118727, 118729, 165 804, 165 805, 219390, 219405, 414331, 392407, C23C 1600

Patent

active

049794647

ABSTRACT:
An apparatus for the treatment of wafers in the manufacture of semiconductor elements in the form of a process buffer through which a plurality of wafers travel at the same time to various treatment stations and which cooperates with a transport apparatus for the wafers. The apparatus has a shaft magazine, in which the treatment stations, each for one wafer, are disposed spaced apart from and above one another. The shaft magazine is provided with a loading and unloading opening, and the treatment stations are movable individually into the vicinity of the loading and unloading opening. The apparatus occupies less surface area in the process line for the manufacture of semiconductor elements, enables treatment of the wafers independent of external factors, and can be used for various types of treatment of the wafers in the manufacture of semiconductor elements.

REFERENCES:
patent: 4362454 (1982-12-01), Kripzak
patent: 4457359 (1984-07-01), Holden
patent: 4457662 (1984-07-01), Ireland et al.
patent: 4527620 (1985-07-01), Pedersen et al.
patent: 4640223 (1987-02-01), Dozier
IBM Technical Disclosure Bulletin, vol. 25, No. 4, Sep. 1982.

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