Apparatus for treating a substrate

Details Apparatus for treating a substrate Apparatus for treating a substrate

2008-02-14

2011-12-27

Hendricks, Keith (Department: 1724)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298260, C204S298140

Reexamination Certificate

active

08083911

ABSTRACT:
This invention relates to an apparatus (1) for treating, e.g. coating, a substrate (35, 39) in a vacuum chamber (2). In this vacuum chamber (2) there are arranged n cathodes (7-10) and n+1 anodes (28-32), each of said anodes adjacent to a cathode (7-10). Each of the n cathodes (7-10) and n of the assigned anodes (29-32) are connected to a power supply (11-14). One of the anodes (28) not being assigned to a cathode (7-10) is connected to an electrical line (63) which is connecting each of the anodes (28-32). A pull-down resistor (34) is connected to said line (63) at its one end and to ground (33) at its other end.

REFERENCES:
patent: 4417968 (1983-11-01), McKelvey
patent: 5126032 (1992-06-01), Szczyrbowski et al.
patent: 5415757 (1995-05-01), Szcyrbowski et al.
patent: 5645699 (1997-07-01), Sieck
patent: 6093293 (2000-07-01), Haag et al.
patent: 6284106 (2001-09-01), Haag et al.
patent: 6454920 (2002-09-01), Haag et al.
patent: 2006/0221540 (2006-10-01), Himori et al.
patent: 2008/0000768 (2008-01-01), Stimson
patent: 40 42 289 (1990-12-01), None
patent: 41 36 655 (1991-11-01), None
patent: 4042289 (1992-07-01), None
patent: 4136655 (1993-05-01), None
patent: 19701575 (1998-07-01), None
patent: 1594153 (2004-05-01), None
patent: 1594153 (2005-11-01), None
patent: 1722005 (2006-11-01), None
patent: 5-222530 (1993-08-01), None
patent: 06002123 (1994-01-01), None
patent: 2001026878 (2001-01-01), None
patent: 2003183829 (2003-07-01), None
patent: WO 2005/052979 (2004-11-01), None

Affiliated with

Also associated with

Rating

Apparatus for treating a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for treating a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for treating a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4263563