Apparatus for trapping residual products in semiconductor...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With etchant gas supply or exhaust structure located outside...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07491291

ABSTRACT:
An apparatus traps residual products before the products can be formed in or flow to a vacuum pump in semiconductor device manufacturing equipment. The apparatus is connected between a process chamber and the vacuum pump and includes first and second cooling plates alternately disposed inside a hollow cylindrical housing. The first cooling plates each have a base and a grid projecting from a surface of the base, and define a vent hole extending through a central portion of the base. Each of the second cooling plates have a base and a grid projecting from a surface of the base, and define a plurality of vent holes extending through an outer peripheral portion of the base. Gaseous products flowing from a process chamber and through the housing are transformed into powder that adheres to the cooling plates.

REFERENCES:
patent: 1940199 (1933-12-01), Wagner
patent: 4506513 (1985-03-01), Max
patent: 4892653 (1990-01-01), Latge
patent: 5456945 (1995-10-01), McMillan et al.
patent: 5545240 (1996-08-01), Tsuru et al.
patent: 5810077 (1998-09-01), Nakamura et al.
patent: RE36408 (1999-11-01), Yamanaka et al.
patent: 6528420 (2003-03-01), Tong et al.
patent: WO 00/51702 (2000-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for trapping residual products in semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for trapping residual products in semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for trapping residual products in semiconductor... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4117857

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.