Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With etchant gas supply or exhaust structure located outside...
Reexamination Certificate
2006-01-03
2009-02-17
Hassanzadeh, Parviz (Department: 1792)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With etchant gas supply or exhaust structure located outside...
Reexamination Certificate
active
07491291
ABSTRACT:
An apparatus traps residual products before the products can be formed in or flow to a vacuum pump in semiconductor device manufacturing equipment. The apparatus is connected between a process chamber and the vacuum pump and includes first and second cooling plates alternately disposed inside a hollow cylindrical housing. The first cooling plates each have a base and a grid projecting from a surface of the base, and define a vent hole extending through a central portion of the base. Each of the second cooling plates have a base and a grid projecting from a surface of the base, and define a plurality of vent holes extending through an outer peripheral portion of the base. Gaseous products flowing from a process chamber and through the housing are transformed into powder that adheres to the cooling plates.
REFERENCES:
patent: 1940199 (1933-12-01), Wagner
patent: 4506513 (1985-03-01), Max
patent: 4892653 (1990-01-01), Latge
patent: 5456945 (1995-10-01), McMillan et al.
patent: 5545240 (1996-08-01), Tsuru et al.
patent: 5810077 (1998-09-01), Nakamura et al.
patent: RE36408 (1999-11-01), Yamanaka et al.
patent: 6528420 (2003-03-01), Tong et al.
patent: WO 00/51702 (2000-09-01), None
Chen Keath
Hassanzadeh Parviz
Samsung Electronics Co,. Ltd.
Volentine & Whitt PLLC
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