Coating apparatus – Gas or vapor deposition – Chamber seal
Patent
1980-03-24
1982-01-26
Lawrence, Evan K.
Coating apparatus
Gas or vapor deposition
Chamber seal
432250, C23C 1308
Patent
active
043122949
ABSTRACT:
In an apparatus for thermal treatment of semiconductors in a treating gas, a cylindrical plug extends into a treating tube so as to substantially fill the treating tube, as far as the cylindrical plug extends into the treating tube, except for a clearance provided around the cylindrical plug, between the cylindrical plug and the treating tube, whereby formation of convection currents in the treating gas is prevented. The cylindrical plug may be separate from a sealing closure, integral with the sealing closure, or integral with the treating tube. If integral with the treating tube, the cylindrical plug has a tubular portion and a bottom portion, which plugs the tubular portion but is removable.
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Clark George R.
Hoover Allen J.
Lawrence Evan K.
Rose Neil M.
Tel-Thermco Engineering Co., Ltd.
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