Apparatus for thermal treatment of semiconductors

Details Apparatus for thermal treatment of semiconductors Apparatus for thermal treatment of semiconductors

1980-03-24

1982-01-12

Lawrence, Evan K.

Coating apparatus

Gas or vapor deposition

Chamber seal

432250, C83C 1308

Patent

active

043099610

ABSTRACT:
As used in an apparatus for thermal treatment of semiconductors, a treating tube has a flanged portion at one end, near an outlet for a treating gas, and a sealing closure has a cylindrical portion and a flanged portion. The flanged portion of the sealing closure is adapted to be interfitted with the flanged portion of the treating tube so as to seal said end. The sealing closure is removable so as to open said end. The cylindrical portion is adapted to be inserted into the treating tank through said end so as to substantially fill the treating tube, as far as the cylindrical portion extends into the tube, except for a clearance provided around the cylindrical portion, between the cylindrical portion and the treating tube, whereby formation of convection currents in the treating gas is prevented. The flanged portion of the treating tube, a hollow interior of the sealing closure, and the flanged portion of the sealing closure are open to an outer atmosphere when the flanged portions are interfitted.

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