Coating apparatus – Gas or vapor deposition – With treating means
Patent
1992-03-16
1992-12-08
Beck, Shrive
Coating apparatus
Gas or vapor deposition
With treating means
118729, 427571, 427577, 427575, C23C 1650
Patent
active
051694522
ABSTRACT:
Diamond-like thin films having high uniformity and high crystallinity are produced by introducing a hydrocarbon material gas into a chamber, ionizing the gas, and depositing the ionized gas on a substrate. The gas is ionized by thermionic emission from two or more files of hot cathodes, each file having a plurality of filaments arranged at substantially uniform intervals in a linear or zigzag line configuration. Each file of hot cathodes is surrounded separately by an anode at a substantially uniform distance from a respective file of the filaments.
REFERENCES:
patent: 3961103 (1976-06-01), Aisenberg
patent: 3974059 (1976-08-01), Murayama
patent: 4440108 (1984-04-01), Little et al.
patent: 4902572 (1990-02-01), Horne et al.
patent: 4974544 (1990-12-01), Ohta
Bunshah et al, Deposition Technologies for Films & Coatings (Noyes, Park Ridge, N.J.) .COPYRGT.1982, pp. 288-289.
"Diamondlike Carbon Films Prepared by Charged Particles", Surface Chemistry, vol. 5, No. 109 (1984).
Nakayama Masatoshi
Shibahara Masanori
Ueda Kunihiro
Beck Shrive
Owens Terry J.
TDK Corporation
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