Wafer supporting jig and a decompressed gas phase growth method

Details Wafer supporting jig and a decompressed gas phase growth method Wafer supporting jig and a decompressed gas phase growth method

1991-05-14

1992-12-08

Wilczewski, Mary

Coating apparatus

Gas or vapor deposition

Work support

437925, 118726, 118500, B05C 1302, H01L 2131, H01L 21205

Patent

active

051694530

ABSTRACT:
A wafer supporting jig that allows formation of a film with an even thickness on a wafer as well as a decompressed gas-phase growth method utilizing such a jig.
A wafer supporting jig according to the invention is realized in the form of a ring made of a heat-resistive material having a central opening.

REFERENCES:
patent: 3493444 (1970-02-01), Sirtl et al.
patent: 3511723 (1970-05-01), Bard
patent: 4113547 (1978-09-01), Katz et al.
patent: 4141764 (1979-02-01), Authier et al.
patent: 4589369 (1986-05-01), Mahler
patent: 4592308 (1986-06-01), Shih et al.
patent: 4877573 (1989-10-01), Nilsson
patent: 5054418 (1991-10-01), Thompson et al.

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