Apparatus for the formation of a functional deposited film using

Details Apparatus for the formation of a functional deposited film using Apparatus for the formation of a functional deposited film using

1987-10-28

1990-03-20

Lawrence, Evan

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 333 99PL, C23C 1648

Patent

active

049091840

ABSTRACT:
An improved apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process is characterized in that the relative setting angle between waveguides confronting each other is set to be 60.degree. or 240.degree. in the counterclockwise direction, which makes it possible to stably introduce the microwave energy into the vacuum chamber simultaneously from the plural microwave power sources without any interference among them.

REFERENCES:
patent: 3212034 (1965-10-01), Kaufman et al.
patent: 4532199 (1985-07-01), Ueno et al.

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