Apparatus for the deposition and film formation of silicon on su

Details Apparatus for the deposition and film formation of silicon on su Apparatus for the deposition and film formation of silicon on su

1991-03-27

1992-12-22

Jones, W. Gary

Coating apparatus

With means to apply electrical and/or radiant energy to work...

Electrostatic and/or electromagnetic attraction or...

118641, B05B 5025, B05C 500

Patent

active

051731215

ABSTRACT:
A novel apparatus for the deposition of silicon and the formation of silicon films. More specifically, the process provides an aerosol generating technique, wherein silicon powder of optimum particle size is aerosolized, charged, and then electrostatically deposited onto high melting point substrates, which may include semiconducting, insulating, and conducting materials such as silicon, sapphire, and molybdenum, respectively. The powder coated substrates are subsequently heat treated at optimum times and temperatures, resulting in the formation of polycrystalline silicon films.

REFERENCES:
patent: 3167255 (1965-01-01), Point et al.
patent: 3382091 (1968-05-01), Drum
patent: 3437072 (1969-04-01), Levinson
patent: 4011991 (1977-03-01), Masuda

Affiliated with

Also associated with

Rating

Apparatus for the deposition and film formation of silicon on su does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for the deposition and film formation of silicon on su, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the deposition and film formation of silicon on su will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-972946