Apparatus for supporting crystalline wafers

Stone working – Work supports

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51216R, 83 98, 125 13R, 269 20, B28D 704

Patent

active

044454945

ABSTRACT:
A process and apparatus for supporting crystalline wafers utilizing the sion effect of flowing gas on the crystalline wafers. An almost point-like support of the crystalline wafer is achieved. Furthermore, the invention relates to a holding tool for carrying out the process, which tool has at the center of the holding face, a point-like projection.

REFERENCES:
patent: 2064794 (1936-12-01), Klauminzer
patent: 3039235 (1962-06-01), Heinrich
patent: 3040486 (1962-06-01), Balsiger
patent: 3132454 (1964-05-01), Balsiger
patent: 3189340 (1965-06-01), Desel
patent: 3449835 (1969-06-01), Liner
patent: 3488674 (1970-01-01), Simjian
patent: 3577861 (1971-05-01), Bender
patent: 4084354 (1978-04-01), Grandia
patent: 4227348 (1980-10-01), Demers

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