Apparatus for supplying a treatment material

Details Apparatus for supplying a treatment material Apparatus for supplying a treatment material

1995-12-29

1998-03-31

Bueker, Richard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118694, 118695, 118708, 118712, 118726, 261127, 261131, 261135, 261141, C23C 1600, B01F 304

Patent

active

057333750

ABSTRACT:
An apparatus for supplying a treating material to a treating device has a tank containing a liquid treating material and a heat exchanger formed by a spiral pipe and provided in the tank. A nitrogen gas (N.sub.2 gas) is introduced into the tank and evaporates the liquid treating material. Water is supplied from a fluid inlet pipe connected to the lower portion of the exchanger to a fluid outlet pipe connected to the upper portion of the exchanger through the spiral pipe of the exchanger. In the heat exchange, heat exchange between the water and the liquid treating material is performed very efficiently. No use of electric power provides high safety. The temperature of the liquid treating material which is changed into a gas state by a bubbling process is controlled efficiently and the density of the vaporized treating material in the tank is made stable.

REFERENCES:
patent: 4563312 (1986-01-01), Takimoto
patent: 5354516 (1994-10-01), Tomita
patent: 5401316 (1995-03-01), Shiraishi
patent: 5474641 (1995-12-01), Otsuki

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