Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1997-10-27
1999-03-02
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429819, 20419212, C23C 1434
Patent
active
058765760
ABSTRACT:
Apparatus for sputtering magnetic target material using a magnetic field shunt within a moving magnet sputtering source. The apparatus includes a magnetic field shunt that is embedded into the target material along the path of the moving magnet assembly at a location where a deep erosion trench is created by the assembly in the target material. The magnetic field shunt provides an alternate path for the magnetic flux that is liberated by the erosion of the target. Alternatively, the magnetic field shunt is physically attached to the magnetic pole piece such that the magnetic shunt moves with the pole piece along the track that the pole piece is moved.
REFERENCES:
patent: 5320728 (1994-06-01), Tepman
patent: 5415754 (1995-05-01), Manley
patent: 5685959 (1997-11-01), Bourez et al.
Applied Materials Inc.
Cantelmo Gregg
Nguyen Nam
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