Apparatus for servicing vacuum chamber using non-reactive gas fi

Coating apparatus – Gas or vapor deposition – Multizone chamber

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C23C 1600

Patent

active

054115930

ABSTRACT:
A process and apparatus is disclosed for providing access to the interior of a vacuum deposition chamber in a vacuum deposition apparatus without exposing residues, such as chlorosilane residues, within the chamber to moisture and/or oxygen-containing gases. The process comprises first placing over the upper surface of the vacuum deposition apparatus an enclosure which has a bottom opening large enough to completely cover the top opening to the chamber, and which is capable of being filled with one or more non-reactive gases. One or more non-reactive gases are then flowed into the enclosure to purge moisture and/or oxygen-containing gases from the enclosure. After the enclosure has been mounted on the apparatus and purged by the flow of non-reactive gases therein, the vacuum deposition chamber may be opened, while continuing the flow of non-reactive gases into the enclosure. After servicing, the vacuum deposition chamber may be resealed, the flow of non-reactive gases shut off, and the enclosure then removed from the apparatus. In a preferred embodiment, the flow of non-reactive gases into the enclosure is positioned to flow down from the top of the enclosure at a right angle to openings in the sidewall of the enclosure provided for accessing the vacuum deposition chamber, to thereby provide a gas curtain of non-reactive gas flow across the openings to inhibit ingress of moisture and/or oxygen-containing gases, as well as particulate impurities, into the enclosure.

REFERENCES:
patent: 4412812 (1983-11-01), Sadowski
patent: 4640223 (1987-02-01), Dozier
patent: 4666734 (1987-05-01), Kamiya
patent: 4901764 (1990-02-01), Meline
patent: 5020475 (1991-06-01), Crabb et al.
patent: 5065698 (1991-11-01), Koike
patent: 5232506 (1993-08-01), Kawase

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