Apparatus for sensing RF current delivered to a plasma with two

Details Apparatus for sensing RF current delivered to a plasma with two Apparatus for sensing RF current delivered to a plasma with two

1997-03-19

1998-09-15

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

324 95, G01R 2716

Patent

active

058084150

ABSTRACT:
An apparatus for sensing RF current delivered to a plasma includes an RF conductor along which the current is delivered to the plasma and which is divided into two parts along part of its length so that substantially equal currents flow in each part. A sensor device is inserted into the gap between the two parts of the conductor and includes first and second inductive loops disposed one on each side of the gap such that when an RF current flows along the RF conductor the magnetic flux surrounding the conductor which is generated by the RF current couples with the loops respectively in opposite directions relative to the sensor device. If a stray magnetic flux normal to the current direction couples with the loops in the same direction relative to the sensor device it will induce voltages in the loops which respectively add to the voltage induced by the RF current in one loop and subtract from the voltage induced by the RF current in the other loop. Thus by adding the voltages induced in the loops, for example by connecting them in series, the voltages induced by the stray magnetic flux tend to cancel.

REFERENCES:
patent: 5041791 (1991-08-01), Ackerman et al.
patent: 5325019 (1994-06-01), Miller et al.
patent: 5565737 (1996-10-01), Keane
Kester, W., "High-Speed Design Seminar", Analog Devices, 2nd ed., pp. I-55 to I-69, Apr. 1990.
Kester, W., "Mixed-Signal Design Seminar", Analog Devices, pp. III-2 to III-11, Mar. 1991.

Affiliated with

Also associated with

Rating

Apparatus for sensing RF current delivered to a plasma with two does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for sensing RF current delivered to a plasma with two , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for sensing RF current delivered to a plasma with two will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-91871