Cleaning and liquid contact with solids – Apparatus – With movable means to cause fluid motion
Reexamination Certificate
2005-05-10
2005-05-10
Stinson, Frankie L. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
With movable means to cause fluid motion
C134S198000, C134S902000, C015S321000
Reexamination Certificate
active
06889698
ABSTRACT:
A process and apparatus for locally removing any material, such as a refractory metal, in particular tungsten, from any desired area of a wafer, such as an alignment mark area of a silicon wafer in process during the formation of integrated circuits thereon.
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Dobson Todd A.
Gordon Brian F.
Hudson Guy F.
Stroupe Hugh E.
Zahorik Russell C.
Micro)n Technology, Inc.
Stinson Frankie L.
TraskBritt
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