Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-12-10
1995-06-13
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429807, 20429808, 20429826, 20429828, C23C 1454
Patent
active
054239702
ABSTRACT:
An apparatus for performing the method comprising a vacuum treatment chamber containing a target of ohmic conductive material. The target and workpiece are supported by suitable electrodes. Superimposed DC and AC power is applied to generate a glow discharge in the chamber in which the target is sputtered. Particles sputtered off the target react with a reactive gas in the space between the target and workpiece and the reaction product is deposited upon the workpiece. The operating parameters of the system are selected so that sputtering and deposition are performed in an unstable transition mode between a metallic and a reactive mode whereby particles are deposited on the workpiece to form a layer on the workpiece of lower conductivity than the target material. A feedback arrangement is preferably utilized to maintain operation with the aforesaid unstable transition mode.
REFERENCES:
patent: 4420385 (1983-12-01), Hartsough
patent: 4931169 (1990-06-01), Scherer et al.
patent: 5026471 (1991-06-01), Latz et al.
patent: 5154810 (1992-10-01), Kamerung et al.
Balzers Aktiengesellschaft
Weinstein Louis
Weisstuch Aaron
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