Apparatus for providing gas to a processing chamber

Details Apparatus for providing gas to a processing chamber Apparatus for providing gas to a processing chamber

2007-03-06

2007-03-06

Neckel, Alexa (Department: 1764)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

C392S386000, C392S388000, C392S389000, C392S390000

Reexamination Certificate

active

10198727

ABSTRACT:
An apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a canister having at least one baffle disposed between two ports and containing a precursor material. The precursor material is adapted to produce a gas vapor when heated to a defined temperature at a defined pressure. The baffle forces a carrier gas to travel an extended mean path between the inlet and outlet ports. In another embodiment, an apparatus for generating gas includes a canister having a tube that directs a carrier gas flowing into the canister away from a precursor material disposed within the canister.

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