Apparatus for projecting a mask pattern on a substrate

Details Apparatus for projecting a mask pattern on a substrate Apparatus for projecting a mask pattern on a substrate

1990-05-25

1992-03-31

Turner, Samuel

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356400, 250557, G01B 902

Patent

active

051002370

ABSTRACT:
An apparatus for projecting a mask pattern (MA) on a substrate (W) by means of a projection lens system (PL) is described, which apparatus comprises a device for aligning a substrate alignment mark (P.sub.1 ; P.sub.2) with respect to a mask alignment mark (M.sub.1 ; M.sub.2), the projection lens system (PL) forming part of the alignment device. A correction element (25) is arranged in this system (PL) to compensate for the fact that this system (PL) is not optimized for the wavelength of the alignment beam (b).

REFERENCES:
patent: 4778275 (1988-10-01), van den Brink et al.
patent: 4795244 (1989-01-01), Uehara et al.

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