Apparatus for projecting a mask pattern on a substrate

Details Apparatus for projecting a mask pattern on a substrate Apparatus for projecting a mask pattern on a substrate

1993-05-06

1996-01-02

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

054813620

ABSTRACT:
An apparatus for projecting a mask pattern (MA) on a substrate (W) by means of a projection lens system (PL) is described, which apparatus comprises a device for aligning a mask alignment mark (M.sub.1, M.sub.2) with respect to a substrate alignment mark (P.sub.1, P.sub.2). Means (WE.sub.1, WE.sub.2) preventing phase differences due to reflections at the mask plate (MA) from occurring within the alignment beam portions received by a detection system (13, 13') are arranged in the path of selected alignment beam portions (b.sub.1, b.sub.1 ').

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