Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1992-09-21
1993-04-20
Bueker, Richard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118723, 264 14, 264 81, 156DIG68, 423446, C23C 1648
Patent
active
052041450
ABSTRACT:
An improved method and apparatus are disclosed for producing large area diamond depositions. A mixture of a carbon compound such as methane, hydrogen and argon is introduced into a DC arc plasma torch to form a plasma jet. The plasma jet is directed and trapped into a partially enclosed chemical vapor deposition zone confined within a reaction chamber of a CVD process. The chemical vapor deposition zone is formed by walls wherein at least one such wall is a rotating substrate cooled to a set temperature. The plasma jet containing radicalized hydrogen and a carbon compound is impinged on the rotating substrate to produce large area diamond layer.
REFERENCES:
patent: 4987002 (1991-01-01), Sakamoto
Article-Japanese Journal of Applied Physics, vol. 27, No. 9, Sep. 1988 pp. L1600-L1602 -Rapid Growth of Diamond Films by Arc Discharge Plasma CVD -Akatsuka et al.
Article-Appl. Phys. Lett. 51 (10) Sep. 7, 1987 -Synthesis of Diamond Films in a rf Induction Thermal Plasma -Matsumoto et al. pp. 737-739.
Article-Rev. Sci. Instrum. 60(2), Feb. 1989 -Development of a New Microwave Plasma Torch and Its Application to Diamond Synthesis -Mitsuda et al. pp. 249-252.
Article -C&EN, May 15, 1989 -Emerging Technology of Diamond Thin Films -Bachmann et al. pp. 24-39.
Bueker Richard
General Electric Company
Pittman William H.
LandOfFree
Apparatus for producing diamonds by chemical vapor deposition an does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for producing diamonds by chemical vapor deposition an, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for producing diamonds by chemical vapor deposition an will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1524914