Apparatus for producing an inductive plasma for plasma processes

Details Apparatus for producing an inductive plasma for plasma processes Apparatus for producing an inductive plasma for plasma processes

1995-06-06

1997-07-22

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723I, 20429808, 20429834, H05H 100

Patent

active

056500327

ABSTRACT:
An efficient RF coil for inductively coupled plasmas provides either capacitive or inductive coupling to the plasma. The coil has a layered structure including at least one RF coil, an insulator having a low dielectric constant and a second RF magnetic structure. The second RF magnetic structure may be either a second RF coil or a Faraday shield. In a two coil structure, the first RF coil has a first magnetic sense upon energization by an RF source, and the second RF coil has a second magnetic sense opposite the first magnetic sense. An RF source is connected to the high voltage ends of the two RF coil. Uniform capacitive coupling is achieved by the use of a Faraday shield located between the RF coil and the plasma.

REFERENCES:
patent: 5531834 (1996-07-01), Ishizuka et al.
patent: 5560776 (1996-10-01), Sugai et al.

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