Apparatus for producing a plasma and for the treatment of substr

Details Apparatus for producing a plasma and for the treatment of substr Apparatus for producing a plasma and for the treatment of substr

1989-05-23

1990-07-03

Boudreau, Leo H.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

315 39, 31511141, 315 35, H01J 1980, H01J 746

Patent

active

049394240

ABSTRACT:
The plasma produced by means of microwaves in the presence of a magnetic field and a gas serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected at the metal walls, so that the chamber has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

REFERENCES:
patent: 3814983 (1974-06-01), Weissfloch et al.
patent: 3906892 (1975-09-01), Van Cakenberghe
patent: 3911318 (1975-10-01), Spero et al.
patent: 4438368 (1984-03-01), Abe et al.
patent: 4521717 (1985-06-01), Kieser

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