Apparatus for processing substrate and method of processing...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S330000, C430S322000, C432S152000

Reexamination Certificate

active

07005238

ABSTRACT:
A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

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Kihara, N. et al., “Effect of Acid Evaporation in Chemically Amplified Resists on Insoluble Layer Formation”, Journal of Photopolymer Science and Technology, vol. 8, No. 4, pp. 561-570, (1995).
Office Action from Japanese Patent Application No. 2001-385349, dated Nov. 11, 2004.

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