Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Reexamination Certificate
2006-11-28
2006-11-28
Kerns, Kevin P. (Department: 1725)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
C422S173000, C422S177000
Reexamination Certificate
active
07141221
ABSTRACT:
An exhaust gas containing a perfluoride component (PFC) and SiF4is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.
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Irie Kazuyoshi
Kanno Shuichi
Mori Toshihiro
Takano Toshihide
Tamata Shin
Antonelli, Terry Stout and Kraus, LLP.
Hitachi , Ltd.
Hitachi Engineering Co. Ltd.
Hitachi Kyowa Engineering Co., Ltd.
Kerns Kevin P.
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