Apparatus for processing negative photoresist

Details Apparatus for processing negative photoresist Apparatus for processing negative photoresist

1983-07-05

1985-04-02

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

2504922, G01N 2300, G01N 2100

Patent

active

045089680

ABSTRACT:
A negative photoresist emulsion, wherein after a film of negative photoresist emulsion on a substrate has been exposed for pattern writing in vacuum to charged particle beams or soft X-ray beams, the film-coated substrate is transferred to, and kept in, a chamber filled with non-oxidizing gas, and then the substrate is removed to the outside atmosphere. By this method, a curing effect of the photoresist film is prevented, enabling formation of fine patterns with precision. An apparatus for carrying out the above method has a gas chamber filled with non-oxidizing gas connected to an exposure chamber, and the substrate, after such exposure, is kept in an atmosphere of non-oxidizing gas in the gas chamber before being removed to the outside atmosphere. In either the above-method or apparatus, the concentration of oxygen in the non-oxidizing gas must be less than 5%, preferably less than 1%.

REFERENCES:
patent: 3643058 (1972-02-01), Long
patent: 4185202 (1980-01-01), Dean et al.
patent: 4239787 (1980-12-01), Rentschler
patent: 4298803 (1981-11-01), Matsuura et al.
NHK Laboratories Note, No. 253, dated Aug. 1980, Tokyo, pp. 3-14.

Affiliated with

Also associated with

Rating

Apparatus for processing negative photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for processing negative photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for processing negative photoresist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1092519