Apparatus for preparing a functional deposited film by microwave

Details Apparatus for preparing a functional deposited film by microwave Apparatus for preparing a functional deposited film by microwave

1995-10-06

1996-12-10

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118730, 118723MP, 20429807, C23C 1600

Patent

active

055826482

ABSTRACT:
A microwave plasma chemical vapor deposition apparatus for forming a functional deposited film on a plurality of Substrates which includes a substantially enclosed film-forming chamber comprising an outer wall having an end portion thereof provided with a microwave introducing window to which a waveguide extending from a microwave power source is connected, The film-forming chamber has a cylindrical discharge space encircled by a plurality of rotatable cylindrical substrate holders. Each of the cylindrical substrate holders has a substrate thereon. The cylindrical substrate holders are concentrically arranged in the film-forming chamber. The film forming chamber is provided with means for evacuating the film-forming chamber and means for supplying a raw material gas into the discharge space. The means for supplying the raw material gas comprises one or more gas feed pipes provided with a plurality of gas liberation holes capable of supplying a raw material gas radiately against each of the substrates. The gas feed pipes are longitudinally installed substantially at the center position of the discharge space.

REFERENCES:
patent: 4840139 (1989-06-01), Takei
patent: 4897281 (1990-01-01), Arai
patent: 4897284 (1990-01-01), Arai
patent: 4958591 (1990-09-01), Yamazaki
patent: 5129359 (1992-07-01), Takei

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