Apparatus for positioning a workpiece in a localized vacuum proc

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2504421, 2504922, 219121EN, 219121EQ, 219121EX, 219121EY, H01J 3718, H01J 3720, H01J 3302

Patent

active

045608806

ABSTRACT:
Apparatus for positioning a semiconductor wafer with respect to a localized vacuum envelope so as to maintain a prescribed gap between the tip of the vacuum envelope and the wafer includes an x-y table, a stage assembly movable along the z-axis for holding the wafer and a z-axis actuator assembly. The z-axis actuator assembly includes a plurality of fluid-containing bellows coupled between the x-y table and the stage assembly and a hydraulic controller operated by a linear stepper motor for varying the fluid volume in each of the bellows in response to an actuator control signal so as to move the stage assembly along the z-axis. The z-axis actuator assembly can further include a flexible disk positioned in the plane of x-y movement and coupled between the x-y table and the stage assembly for preventing lateral and rotational movement of the stage assembly relative to the x-y table. The positioning apparatus is suitable for use in an electron beam lithography system.

REFERENCES:
patent: 4191385 (1980-03-01), Fox
patent: 4342900 (1982-08-01), Susei et al.
patent: 4344160 (1982-08-01), Gabriel et al.
patent: 4358657 (1982-11-01), Steigerwald et al.
Lewis et al., "A Laser Interferometer Controlled X,Y Air Bearing for Direct Wafer Exposure Electron Beam Lithography," Proc. 10th Int. Conf. on Electron and Ion Beam Science and Technology, p. 477 (1982).
Fox, "Planar Vacuum Seal for Isolating an Air Bearing," U.S. Ser. No. 107,207, filed Dec. 16, 1979 (Corresponding PCT Appl. No. US80/01718, published Jul. 8, 1982).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for positioning a workpiece in a localized vacuum proc does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for positioning a workpiece in a localized vacuum proc, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for positioning a workpiece in a localized vacuum proc will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1481371

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.