Apparatus for plasma treatment of the inside surface of a fuel t

Coating apparatus – Gas or vapor deposition – With treating means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118715, 118723MP, 118 501, 156345, 31511121, 427237, 427238, C23C 1600

Patent

active

056907451

ABSTRACT:
A treatment chamber (1) evacuable by vacuum pumps (13,13') has a mounting (26,26', . . .) bearing the hollow body (4) in the treatment chamber (1), and a line (9,9') for the admission of a process gas into the treatment chamber (1). A microwave conductor (20,20' . . .) is connected with a generator (19,19' . . .) for igniting a plasma in the area of channels formed by a sheet-metal shroud (2,2') matching the configuration of the hollow body (4). A closure (7,7') is provided through which the filler opening (6, 6') of the hollow body (4) can be closed pressure-tight, and a line (9,9') for the process gas passes through the closure.

REFERENCES:
patent: 4261806 (1981-04-01), Asai et al.
patent: 4668479 (1987-05-01), Manabe et al.
patent: 4786522 (1988-11-01), Fukuta et al.
patent: 4874453 (1989-10-01), Fukuta et al.
patent: 5226968 (1993-07-01), Ohmi et al.
patent: 5236636 (1993-08-01), Tisack
patent: 5378510 (1995-01-01), Thomas et al.
patent: 5468295 (1995-11-01), Marantz et al.
patent: 5521351 (1996-05-01), Mahoney
patent: 5565248 (1996-10-01), Plester et al.
patent: 5591267 (1997-01-01), Ohmi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for plasma treatment of the inside surface of a fuel t does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for plasma treatment of the inside surface of a fuel t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for plasma treatment of the inside surface of a fuel t will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2103208

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.