Abrading – Machine – Rotary tool
Patent
1993-04-08
1995-06-06
Rose, Robert A.
Abrading
Machine
Rotary tool
451285, 451 41, 451288, 451526, B24B 722
Patent
active
054217695
ABSTRACT:
An apparatus for planarizing semiconductor wafers in its preferred form includes a rotatable platen for polishing a surface of the semiconductor wafer and a motor for rotating the platen. A non-circular pad is mounted atop the platen to engage and polish the surface of the semiconductor wafer. A polishing head holds the surface of the semiconductor wafer in juxtaposition relative to the non-circular pad. A polishing head displacement mechanism moves the polishing head and semiconductor wafer across and past a peripheral edge of the non-circular pad to effectuate a uniform polish of the semiconductor wafer surface. Also disclosed is a method for planarizing a semiconductor surface using a non-circular polishing pad.
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Doan Trung T.
Schultz Laurence D.
Tuttle Mark E.
Micro)n Technology, Inc.
Rose Robert A.
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