Apparatus for performing plasma chemical vapor deposition

Details Apparatus for performing plasma chemical vapor deposition Apparatus for performing plasma chemical vapor deposition

1984-09-13

1987-06-30

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118729, 118730, 118 501, 427 39, C23C 1648

Patent

active

046761950

ABSTRACT:
In a capacitance coupled type plasma CVD apparatus for depositing a thin film of reaction product of gas on a substrate by glow discharge at an elevated film-forming rate without lowering the function and ability of the formed film and to ensure the CVD operation to be carried out continuously or repetitively for an extended period of time, the electrode facing the substrate is provided as a net of a metal. The substrate is a cylindrical electrode, and the net-like electrode may be formed as a cylindrical net surrounding this cylindrical substrate, or as a pair of opposing flat sheets of net movably sandwiching rotating and movable plural cylindrical substrates therebetween.

REFERENCES:
patent: 3069286 (1962-12-01), Hall
patent: 3915119 (1975-10-01), Roy
patent: 3996884 (1976-12-01), Horiguchi
patent: 4262631 (1981-04-01), Kubacki
patent: 4418645 (1983-12-01), Knights
patent: 4450787 (1984-05-01), Weakliem et al.
patent: 4466380 (1984-08-01), Jansen et al.
patent: 4501766 (1985-02-01), Suzuki et al.
patent: 4543267 (1985-09-01), Yamazaki

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