Apparatus for performing at least one process on a substrate

Details Apparatus for performing at least one process on a substrate Apparatus for performing at least one process on a substrate

2007-04-03

2007-04-03

Moore, Karla (Department: 1763)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S733000, C156S345310

Reexamination Certificate

active

10332381

ABSTRACT:
Apparatus for performing at least one processing operation on a substrate, the apparatus being provided with at least one process chamber and a vacuum lock for the purposes of placing the substrate from the surroundings into a process chamber without the reduced pressure in the respective process chamber being lost, the vacuum lock comprising a vacuum chamber which is bounded by a number of walls and to which a vacuum pump is connected, while in one of the walls at least one supply opening is provided, and for the purpose of the or each process chamber in one of the walls a process chamber opening belonging to a respective process chamber is provided, the at least one supply opening being externally closable with an outer cover and being closable from the vacuum chamber with an inner cover. Further disclosed is an assembly of such an apparatus with a transport device for supplying substrates to a supply opening of the vacuum lock and removing same.

REFERENCES:
patent: 5871588 (1999-02-01), Moslehi et al.
patent: 5876082 (1999-03-01), Kempf et al.
patent: 6203677 (2001-03-01), Konig
patent: 6317406 (2001-11-01), Konig et al.
patent: 0 448 782 (1991-10-01), None
patent: 0 905 275 (1999-03-01), None
patent: 0 905 275 (2002-02-01), None
patent: 7-292740 (1995-11-01), None
patent: 07292470 (1995-11-01), None

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