Apparatus for modifying and measuring diamond and other...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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C250S234000, C250S235000, C250S306000, C250S307000, C250S216000, C356S370000

Reexamination Certificate

active

11067609

ABSTRACT:
Apparatus and techniques are provided for modifying and measuring surfaces of diamond workpieces and other workpieces with nanoscale precision. The apparatus and techniques exploit scanning probe microscopy (SPM) and atomic force microscopy (AFM) at a wide range of operating temperatures. In some embodiments, the SPM/AFM apparatus also includes an interferometric microscope and/or acoustic-wave microscope for making high-precision measurements of workpiece surfaces.

REFERENCES:
patent: 5821545 (1998-10-01), Lindsay et al.
patent: 6144028 (2000-11-01), Kley
patent: 6252226 (2001-06-01), Kley
patent: 6337479 (2002-01-01), Kley
patent: 6339217 (2002-01-01), Kley
patent: 6353219 (2002-03-01), Kley
patent: 6871527 (2005-03-01), Hansma et al.
R. Komanduri et al., “Finishing of Silicon Nitride Balls,” Oklahoma State University, Web Page at asset.okstate.edu/asset/finish.html downloaded on Feb. 8, 2005.
Physik Instrumente (Pl) GmbH, “Datasheets: Options and Accessories,” Web page at www.physikinstrumente.de/products/prdetail.php?secid=1-39.
Nonlinear Optics and Optoelectronics Lab, University Roma Tre (Italy), “Germanium on Silicon Near Infrared Photodetectors,” Web page at optow.ele.uniroma3.it/optow—2002/labs/SiGeNIR files/SiGeNIR.html downloaded from Internet on Feb. 8, 2005.
Saint-Gobain Ceramics, “ASTM F2094 Si3N4Cerbec Ball Specifications,” Web page at www.cerbec.com/TechInfo/TechSpec.as downloaded from Internet on Feb. 8, 2005.
C.R. Stoldt et al., “Novel Low-Temperature CVD Process for Silicon Carbide MEMS” (preprint), C.R. Stoldt, C. Carraro, W.R. Ashurst, M.C. Fritz, D. Gao, and R. Maboudian, Department of Chemical Engineering, University of California, Berkeley.
J.P. Sullivan et al., “Amorphous Diamond MEMS and Sensors,” Sandia National Labs Report SAND2002-1755 (2002).
Tong et al., “Amorphous Silicon Carbide Films by Plasma-Enhanced Chemical Vapor Deposition” Proceedings of the IEEE Micro Electro Mechanical Systems Workshop, Feb. 1993, Florida, p. 246.
University of Wisconsin—Stout—Statics and Strength of Material, (Physics 372-321), Topic 6.5:Pressure Vessels—Thin Wall Pressure Vessels, Web page at physics.uwstout.edu/StatStr/Statics/index.htm. downloaded on Feb. 8, 2005.

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