Optical: systems and elements – Lens – With support
Reissue Patent
2011-07-19
2011-07-19
Thompson, Timothy J (Department: 2873)
Optical: systems and elements
Lens
With support
C359S819000
Reissue Patent
active
RE042556
ABSTRACT:
An apparatus for immersion lithography that includes an imaging lens which has a front surface, ainsert-start id="REI-00001" date="20110719" ?fluid-containing wafer stage for supporting ainsert-end id="REI-00001" ?wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens,delete-start id="REI-00002" date="20110719" ?and a fluid that has a refractive index between about 1.0 and about 2.0delete-end id="REI-00002" ?insert-start id="REI-00003" date="20110719" ?the fluidinsert-end id="REI-00003" ?filling a gap formed in-between the front surface of the imaging lens and the top surface of the wafer. A method for immersion lithography can be carried out by flowing a fluid through a gap formed in-between the front surface of an imaging lens and a top surface of a wafer. The flow rate and temperature of the fluid can be controlled while particulate contaminants are filtered out by a filtering device.
REFERENCES:
patent: 3648587 (1972-03-01), Stevens
patent: 4057347 (1977-11-01), Moriyama et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5139661 (1992-08-01), Kolbert
patent: 5541995 (1996-07-01), Normile et al.
patent: 6191429 (2001-02-01), Suwa
patent: 2001/0002315 (2001-05-01), Schultz et al.
Slater & Matsil L.L.P.
Taiwan Semiconductor Manufacturing Company , Ltd.
Thompson Timothy J
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