Apparatus for mechanically cleaning the edges of wafers

Details Apparatus for mechanically cleaning the edges of wafers Apparatus for mechanically cleaning the edges of wafers

1996-12-03

1999-08-17

Spisich, Mark

Brushing, scrubbing, and general cleaning

Machines

Brushing

15 883, 15179, A46B 1304, B08B 104, B08B 1100

Patent

active

059374691

ABSTRACT:
A method and apparatus for cleaning the edges of substrates. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction at a point of contact between the wafer and a wafer edge brush. In one embodiment, the cleaning mechanism includes a side brush that cleans the top-side or bottom-side of a wafer. The side brush is rotated by a motor that is attached to a first end of the side brush. An edge brush is attached to a second end of the side brush and is rotated along with the side brush to clean the edge of the wafer.

REFERENCES:
patent: 338157 (1886-03-01), Jones
patent: 843222 (1907-02-01), Luther
patent: 892129 (1908-06-01), Broderick
patent: 1217803 (1917-02-01), Mefford
patent: 2394338 (1946-02-01), Stine
patent: 2944278 (1960-07-01), Bullard
patent: 4027686 (1977-06-01), Shortes et al.
patent: 4326553 (1982-04-01), Hall
patent: 5350428 (1994-09-01), Leroux et al.
patent: 5351360 (1994-10-01), Suzuki et al.

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