Apparatus for measuring film thickness

Details Apparatus for measuring film thickness Apparatus for measuring film thickness

1984-08-30

1986-08-19

Willis, Davis L.

Optics: measuring and testing

By polarized light examination

Of surface reflection

356382, G01B 1106, G01N 2121

Patent

active

046066411

ABSTRACT:
An elliptically polarized monochromatic light is obtained from monochromatic light select unit and is reflected at an interface between an objective film and substrate. An extinction wavelength of the reflected light, when the amount thereof detected at photodetector becomes zero, is detected at control unit and the true thickness of the film is calculated from the detected extinction wavelength.

REFERENCES:
patent: 4015127 (1977-03-01), Sharkins
patent: 4129781 (1978-12-01), Doyle
patent: 4332476 (1982-06-01), Stenberg et al.
Bey "Optical Film Thickness Monitoring", Rev. Sci. Instru. vol. 42, No. 1, pp. 57-60, Jan. 1971.
Hunderi, "Rotating Depolarizer Ellipsometry", Applied Optics, vol. 16, No. 11, pp. 3012-3015, Nov. 1977.
Harris et al., "Signal Level Regulation and Dark Current Compensation for Wavelength-Scanning Ellipsometer", IBM Tech. Discl. Bull. vol. 21, No. 7, pp. 855-856, Jul. 1978.

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