Measuring and testing – Gas analysis – Solid content of gas
Patent
1996-05-28
1999-03-09
Brock, Michael
Measuring and testing
Gas analysis
Solid content of gas
73 2805, 738655, 7386322, G01N 1502
Patent
active
058803556
ABSTRACT:
An apparatus and a method of measuring contamination particles generated during manufacturing of semiconductor devices and an analysis method therefor are described. The apparatus for measuring contamination particles has a regulator for controlling the flow of source gas, a first junction, a first filter, a first air valve, a test component, a second junction, a flow pressure reducer, a third junction, a particle counter, a second pump, a computer system, a third air valve, a flow meter, a second filter, a second air valve, a fourth junction, a third filter, an impactor, and a first pump. It is possible to analyze structures and elements of the contamination particles generated from a gas delivery system (GDS) and from at least one utility component constituting the system. Further, it is possible to set up a reference for controlling the contamination particles generated from the GDS and from at least one of the utility components.
REFERENCES:
patent: 3888112 (1975-06-01), De Leeuw et al.
patent: 4590792 (1986-05-01), Chiang
patent: 5255555 (1993-10-01), McKeique
Kang Hee-se
Kim Jin-Sung
Moon Sang-young
Park Sang-o
Brock Michael
Samsung Electronics Co,. Ltd.
LandOfFree
Apparatus for measuring contamination particles during the manuf does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for measuring contamination particles during the manuf, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for measuring contamination particles during the manuf will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1323000