Apparatus for measuring a set of electrical characteristics...

Electricity: measuring and testing – Measuring – testing – or sensing electricity – per se – Frequency of cyclic current or voltage

Reexamination Certificate

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C324S076110, C324S076650, C324S076670, C250S492200, C356S316000

Reexamination Certificate

active

11172014

ABSTRACT:
A probe apparatus configured to measure a set of electrical characteristics in a plasma processing chamber, the plasma processing chamber including a set of plasma chamber surfaces configured to be exposed to a plasma is disclosed. The probe apparatus includes a collection disk structure configured to be exposed to the plasma, whereby the collection disk structure is coplanar with at least one of the set of plasma chamber surfaces. The probe apparatus also includes a conductive path configured to transmit the set of electrical characteristics from the collection disk structure to a set of transducers, wherein the set of electrical characteristics is generated by an ion flux of the plasma. The probe apparatus further includes an insulation barrier configured to substantially electrically separate the collection disk and the conductive path from the set of plasma chamber surfaces.

REFERENCES:
patent: 5936413 (1999-08-01), Booth et al.
patent: 6902646 (2005-06-01), Mahoney et al.
patent: 0792571 (1996-09-01), None
patent: 2738984 (1995-09-01), None
patent: 9711587 (1997-03-01), None
Braithwaite et al. “Transient Rfself-bias in electropositive and electronegative plasmas”, (2003), J. Phys. D: Appl. Phys. 36 pp. 2837-2844.
Jean-Paul Booth, “Diagnostics of etching plasmas”, (2002), Pure Appl. Chem., vol. 74, No. 3, pp. 397-400.
Braithwaite et al., “A novel electrostatic probe method for ion flux measurements”, (1996), Plasma Sources Sci. Technol. 5 pp. 677-684.
Booth et al., “Measurements of characteristic transients of planar electroststic probes in cold plasmas”, (Jul. 2000), Rev. Sci. Instrum., vol. 71, No. 7.

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