Apparatus for marking a substrate using ionized gas

Details Apparatus for marking a substrate using ionized gas Apparatus for marking a substrate using ionized gas

1993-07-19

1995-12-12

Chaudhuri, Olik

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 71, C23F 102

Patent

active

054746400

ABSTRACT:
An apparatus suitable for marking a substrate comprises a holder for holding a substrate and a ground for electrically grounding the substrate. At least one needle electrode has a tip located proximate to the substrate so that there is a gap between the substrate and the tip. A high voltage source provides a current to the electrode tip to ionize the gas in the gap so that the ionized gas can impinge upon and mark the substrate.

REFERENCES:
patent: 3428872 (1969-02-01), Yoshida et al.
patent: 3583561 (1971-06-01), Wiesler et al.
patent: 3783044 (1974-01-01), Cheskis et al.
patent: 4316093 (1982-02-01), Broers et al.
patent: 4343993 (1982-08-01), Binnig et al.
patent: 4348803 (1982-09-01), Sasaki
patent: 4382186 (1983-05-01), Denholm et al.
patent: 4418467 (1983-12-01), Iwai
patent: 4550257 (1985-10-01), Binnig et al.
patent: 4569743 (1986-02-01), Bayer et al.
patent: 4610774 (1986-09-01), Sakata et al.
patent: 4724318 (1988-02-01), Binnig
patent: 4785189 (1988-11-01), Wells
patent: 4851097 (1989-07-01), Hattori et al.
patent: 4874459 (1989-10-01), Coldren et al.
patent: 4981529 (1990-01-01), Tsujita
patent: 5047649 (1991-09-01), Hodgson et al.
patent: 5062364 (1991-11-01), Lewis et al.
patent: 5081353 (1992-01-01), Yamada et al.
patent: 5086015 (1992-02-01), Itoh et al.
patent: 5091052 (1992-02-01), Nowak et al.
patent: 5128280 (1992-07-01), Matsumoto et al.
patent: 5149404 (1992-09-01), Blonder et al.
patent: 5157003 (1992-10-01), Tsuji et al.

Affiliated with

Also associated with

Rating

Apparatus for marking a substrate using ionized gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for marking a substrate using ionized gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for marking a substrate using ionized gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1357566