Apparatus for manufacturing substrate

Coating apparatus – Gas or vapor deposition – Multizone chamber

Reexamination Certificate

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Details

C156S345320, C414S935000, C414S939000

Reexamination Certificate

active

07905960

ABSTRACT:
An apparatus for manufacturing a substrate includes: a transferring chamber extended along a long direction; at least one process chamber connected to the transferring chamber along the long direction; at least one load-lock chamber connected to the transferring chamber at least one side of the transferring chamber; and a transferring chamber robot moving along the long direction in the transferring chamber and transferring a substrate.

REFERENCES:
patent: 5564889 (1996-10-01), Araki
patent: 6109860 (2000-08-01), Ogawa et al.
patent: 6176668 (2001-01-01), Kurita et al.
patent: 6235634 (2001-05-01), White et al.
patent: 2001/0041129 (2001-11-01), Tsuneda et al.
patent: 2002/0044855 (2002-04-01), Davis
patent: 2002/0134506 (2002-09-01), Franklin et al.
patent: 2003/0136515 (2003-07-01), Saeki et al.
patent: 2003/0155076 (2003-08-01), Murakami
patent: 2004/0168633 (2004-09-01), Nozawa et al.
patent: 2004/0226510 (2004-11-01), Hanson et al.
patent: 1308565 (2001-08-01), None
patent: 1446742 (2003-10-01), None
patent: 1998-0014228 (1998-04-01), None
English Language abstract of Korean Patent Application No. 1998-0014228.

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