Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2011-03-15
2011-03-15
Moore, Karla (Department: 1712)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C156S345320, C414S935000, C414S939000
Reexamination Certificate
active
07905960
ABSTRACT:
An apparatus for manufacturing a substrate includes: a transferring chamber extended along a long direction; at least one process chamber connected to the transferring chamber along the long direction; at least one load-lock chamber connected to the transferring chamber at least one side of the transferring chamber; and a transferring chamber robot moving along the long direction in the transferring chamber and transferring a substrate.
REFERENCES:
patent: 5564889 (1996-10-01), Araki
patent: 6109860 (2000-08-01), Ogawa et al.
patent: 6176668 (2001-01-01), Kurita et al.
patent: 6235634 (2001-05-01), White et al.
patent: 2001/0041129 (2001-11-01), Tsuneda et al.
patent: 2002/0044855 (2002-04-01), Davis
patent: 2002/0134506 (2002-09-01), Franklin et al.
patent: 2003/0136515 (2003-07-01), Saeki et al.
patent: 2003/0155076 (2003-08-01), Murakami
patent: 2004/0168633 (2004-09-01), Nozawa et al.
patent: 2004/0226510 (2004-11-01), Hanson et al.
patent: 1308565 (2001-08-01), None
patent: 1446742 (2003-10-01), None
patent: 1998-0014228 (1998-04-01), None
English Language abstract of Korean Patent Application No. 1998-0014228.
Choi Jae-Wook
Kim Young-rok
Ford Nathan K
Jusung Engineering Co. Ltd.
Moore Karla
Portland IP Law LLC
LandOfFree
Apparatus for manufacturing substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus for manufacturing substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for manufacturing substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2769367