Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus
Reexamination Certificate
2007-07-13
2008-12-30
Hiteshew, Felisa C (Department: 1792)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
C117S014000, C117S015000, C117S201000, C117S202000
Reexamination Certificate
active
07470326
ABSTRACT:
The apparatus for manufacturing a silicon single crystal includes: a crucible for storing molten silicon; a pulling-up device for pulling up a silicon single crystal from the molten silicon in the crucible to grow; a detecting device for detecting a position of the crucible in a vertical direction; and a control device for controlling a pulling rate for the silicon single crystal by the pulling-up device, based on the detected position of the crucible.
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patent: 7172656 (2007-02-01), Takanashi et al.
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patent: 2000-143388 (2000-05-01), None
patent: 2001-220285 (2001-08-01), None
Sato Satoshi
Suzuki Youji
Hiteshew Felisa C
Pillsbury Winthrop Shaw & Pittman LLP
Sumitomo Mitsubishi Silicon Corporation
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