Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1995-09-18
1997-10-21
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Multizone chamber
118724, 118725, 118728, 118729, 118730, 156345, C23C 1600, C23F 102
Patent
active
056791658
ABSTRACT:
An apparatus, for forming a film according to an automated continuous CVD (Chemical Vapor Deposition) method includes a wafer holder having a plurality of separate, detachable susceptors, a rotary shaft for rotating the wafer holder to rotate wafer mounting surfaces of the susceptors in one plane, a gas distributor spaced from the wafer holder and facing the moving surface of the wafer mounting surface to discharge a reaction gas onto the wafer mounting surfaces, and a heating instrument spaced from the wafer holder and facing the moving surface of the opposite side of the wafer mounting surfaces, in order to keep the wafer at a stable temperature during forming a film and to allow maintenance and repair to be easily and efficiently performed.
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Chino Hiroshi
Maeda Kazuo
Ohira Kouichi
Alcan-Tech Co., Inc.
Breneman R. Bruce
Canon Sales Co., Inc.
McDonald Rodney G.
Semiconductor Process Laboratory Co. Ltd.
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