Apparatus for making a semiconductor

Details Apparatus for making a semiconductor Apparatus for making a semiconductor

1995-05-05

1996-10-01

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

156345, 118718, 20429807, C23C 1600

Patent

active

055607772

ABSTRACT:
An apparatus for making a semiconductor at atmospheric pressure having a first electrode and second electrode which are adapted to receive an RF voltage to perform corona discharge, the first electrode and second electrode together forming a corona discharge chamber, a supporter for supporting a substrate below the discharge chamber, a gas supply system for supplying a reactive gas to the discharge chamber, and an exhaust system installed around the substrate supporter and the electrodes and adapted to prevent a substrate supported by the supporter from being contaminated by external air, wherein the gas supply system and gas exhaust system maintain a region above the supporter at atmospheric pressure during a corona discharge operation.

REFERENCES:
patent: 4664951 (1987-05-01), Doehler
patent: 5074456 (1991-12-01), Degner
patent: 5366555 (1994-11-01), Kelly

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